The Design of High-End Pressure Control Valve (PCV) Control System with DeviceNet Interface in Semiconductor Wafer Foundry

Authors

  • Wei-Cheng Lin
  • Te-Hsun Liu

Keywords:

Pressure Control Valve (PCV), DeviceNet, Semiconductor Industry

Abstract

This paper presents a novel design of control system with features of DeviceNet interface and remotely accessible database via Internet for high precision pressure control valve (PCV). This PCV control system is particularly suitable for pressure/flow process control within vacuum chamber in the fully automated manufacturing machines for semiconductor industry ranging from wafer foundry, LCD/LED panel plant to photoelectric plant. In 2015, Taiwan-based Fred Automation Corporation has been successfully implemented this PCV control system for field testing in the evaluation of performance and benefits.

Author Biographies

Wei-Cheng Lin

Te-Hsun Liu

References

• Open DeviceNet Vendor Association (ODVA), Inc. (2001). DeviceNet Technical Overview, ODVA Inc., http://www.odva.org/

• Controller Area Network (CAN) (2003~2013), ISO11898-1~6.

• MKS INSTRUMENTS, Inc. http://www.mksinst.com/index.aspx

• Fieldbus (2008), IEC 61158.

• TPSS (Taiwan Patent Search System), Intellectual Property Office, Ministry of Economic Affairs, Taiwan.

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How to Cite

Lin, W.-C., & Liu, T.-H. (1). The Design of High-End Pressure Control Valve (PCV) Control System with DeviceNet Interface in Semiconductor Wafer Foundry. Asian Journal of Applied Sciences, 4(2). Retrieved from https://www.ajouronline.com/index.php/AJAS/article/view/3787

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Section

Articles